Edinburgh: low-temperature cell patterning technology

Licensing opportunity

Researchers at Edinburgh University have developed a highly consistent, simple and cost-effective cell patterning scheme that has been demonstrated to accurately guide glia and neurons in an elegant and reliable fashion.

The technology, based on the principles of Selective Molecular Assembly Patterning (SMAP), uses photo-lithography to generate a pattern of two complementary substrates of parylene-C and SiO2. These materials are later activated through immersion and incubation in serum, and are then ready to pattern neurons and glia.

The researchers say the technique is much simpler than existing protocols, is highly reliable and can be embedded into most microfabrication processes as it does not have any high-temperature requirements. Furthermore, the patterning substrates can be produced en masse and stored for use at a later date.

Key benefits include full compatibility with microfabrication technology as a low temperature, in bulk, technique; patterns can be printed and then stored for activation when required; the biological commitment process is a simple immersion step; the technique works on wide range of cell types, including glia, neurons, stem cells and neuronal progenitor cells; it is simple, inexpensive and reliable and can be employed in medical implants; and it is easy to align, and therefore compatible with multi-electrode arrays and biosensors.

Applications include cell-based biosensors – using microorganisms cultured on microelectrode assays for environmental monitoring of pollutants; drug screening – since the technique enables cells to interact with materials, compounds, components or devices; drug discovery – development of miniaturised cell-based systems specifically engineered to mimic in vivo behaviour; and tissue reconstruction – channeling human nerve cells from an amputated limb through a prosthetic device.

The university would like to hear from companies wishing to license this technology or collaborate and work on its future development. Those interested should visit the project page at http://www.university-technology.com/details/improved-cell-patterning-method-to-guide-cell-growth.